IMPULSE+ the latest system for integrated process control enabling both optical critical dimension (OCD) and thin film metrology

Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control systems, today announced the launch of IMPULSE®+, its latest system for integrated process control enabling both optical critical dimension (OCD) and thin film metrology.  The IMPULSE+ has already been deployed for high-volume manufacturing of second-generation 3D-NAND as well as development of third-generation devices. “Many of Read more about IMPULSE+ the latest system for integrated process control enabling both optical critical dimension (OCD) and thin film metrology[…]